AJP Fizika A
Institute of Physics
Ministry of Science and Education
Republic of Azerbaijan
ISSN 1028-8546
Azerbaijan Journal of Physics
Published from 1995. Registration number: 514, 20 02 1995
Ministry of Press and Information of Azerbaijan Republic
2022 02 az p.10-11 | Kh.S. Aliyeva1, A.E. Mammadova2, S.I. Huseynova3, I.Sh. Sardarova4, Production technology and study of electrophysical properties of palladium silicide |
ABSTRACT The production technology of palladium silicide and its electrophysical properties are considered. It is established that PdSi is obtained at 410°C and its resistivity varies in the range 28÷36 mkOhm∙sm. Keywords: silicon, layer, photosensitivity, integrated circuit, adhesion, solvent, Schottky barrier, photoreceiver. PACS: 73.40.Ns, 73.40.Sx, 72.10.-d DOI:- Received: 19.01.2022 AUTHORS & AFFILIATIONS 1. Scientific Research Aerospace Informatics Institute, 1 S.S. Akhundov street, Baku, AZ 1115 2. Agdam State College of Social Economy, Agdam region, AZ 0200 3. Azerbaijan University of Architecture and Construction, 5 Ayna Sultanova, Baku AZ 1073 E-mail: E_Kerimov.fizik@mail.ru |
REFERENCIES [1] T.E. Mekhtiev, N.F. Kasymov. Photodedektor on PtSi–Si Basis with Coding Device. Turkish Journal of Physics, v.20, 1996, pp.891-895. [2] Э.А. Керимов. Metal silisidi–silisium əsasında fotodiodların fotoelektrik xassələri. Azərbaycan Milli Aerokosmik Agentliyinin Xəbərləri. Bakı-2012, Cild 15, № 4(15), s. 43-47. [3] E.Ə. Kərimov, B.Ə. Quluzadə, R.R. Həsənov. Pd–Si strukturların alınma texnologiyası və fotoelektrik xassələri. Fiizika, 2012, c. XV, № 4, s. 35-37. [4] Ж.И. Алферов, М.А. Королев, М.Ю.Райнова, В.И. Шевяков. Окисление силицидов тугоплавких металлов и его применение в технологии полупроводниковых приборов и ИС. Москва, ЦНИИ “Электроника”, 2018, c. 42. |